By Lawrence Casper
content material: Analytical ways and professional platforms within the characterization of microelectronic units / D.E. Passoja, Lawrence A. Casper, and A.J. Scharman --
electric characterization of semiconductor fabrics and units / Dieter okay. Schroder --
Dopant profiles via the spreading resistance approach / Robert G. Mazur --
Scanning electron microscopic concepts for characterization of semiconductor fabrics / Rodney A. younger and Ronald V. Kalin --
Semiconductor fabrics disorder diagnostics for submicrometer very huge scale integration expertise / G.A. Rozgonyi and D.K. Sadana --
functions of secondary ion mass spectroscopy to characterization of microelectronic fabrics / Mary Ryan-Hotchkiss --
purposes of Auger electron spectroscopy in microelectronics / Paul A. Lindfors, Ronald W. Kee, and Douglas L. Jones --
X-ray photoelectron spectroscopy utilized to microelectronic fabrics / William F. Stickle and Kenneth D. Bomben --
software of neutron intensity profiling to microelectronic fabrics processing / R.G. Downing, J.T. Maki, and R.F. Fleming --
Thermal-wave size of thin-film thickness / Allan Rosencwaig --
Characterization of fabrics, skinny motion pictures, and interfaces by way of optical reflectance and ellipsometric options / D.E. Aspnes --
dimension of the oxygen and carbon content material of silicon wafers via Fourier remodel IR spectrophotometry / Aslan Baghdadi --
software of the Raman microprobe to analytical difficulties of microelectronics / Fran Adar --
Characterization of gallium arsenide via magneto-optical photoluminescent spectroscopy / D.C. Reynolds --
Thermal-wave imaging in a scanning electron microscope / Allan Rosencwaig --
Fourier remodel mass spectrometry within the microelectronics provider laboratory / W.H. Penzel --
fabrics characterization utilizing elemental and isotopic analyses by way of inductively coupled plasma mass spectrometry / B. Shushan, E.S.K. Quan, A. Boorn, D.J. Douglas, and G. Rosenblatt --
Activation research of electronics fabrics / Richard M. Lindstrom --
hint aspect survey analyses through spark resource mass spectrography / Fredric D. Leipziger and Richard J. Guidoboni --
Characterization of elements in plasma phosphorus-doped oxides / Jana Houskova, Kim-Khanh N. Ho, and Marjorie ok. Balazs --
strategy keep watch over of vacuum-deposited nickel-chromium for the fabrication of reproducible thin-film resistors / Vineet S. Dharmadhikari --
Characterization of spin-on glass movies as a planarizing dielectric / Satish okay. Gupta and Roland L. Chin --
results of varied chemistries on silicon-wafer cleansing / D. Scott Becker, William R. Schmidt, Charlie A. Peterson, and Don C. Burkman --
tracking of debris in gases with a laser counter / C.E. Nowakowski and J.V. Martinez de Pinillos --
Microelectronics processing challenge fixing : the synergism of complementary options / J.N. Ramsey.
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